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Semi-conductors

Bakelite's Resins for Semiconductor Photoresist

Bakelite® and Durite™ phenolic/cresylic resins are ideal for photoresist formulations used to manufacture components for the microeletronics industry.

Optimized monomer ratios and controlled processing allow Bakelite to produce a resign portfolio with a range of molecular weights and dissolution rates. Benefits of our resins include: 

  • Improved resolution
  • Better sensitivity 
  • Improved heat resistance
  • Excellent substrate adhesion

These resins are specifically designed for g-line, i-line and advanced i-line photoresist processes.

Semiconductor

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Michael Stahl

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Gaye Haas, Heike Haas

Your contact for Phenolic and Amino Resins.

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Ramesh Pisipati

Your contact for Aromatic Polyols.

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Rene Hackler

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Jan Prins

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