Bakelite® and Durite™ phenolic/cresylic resins are ideal for photoresist formulations used to manufacture components for the microeletronics industry.
Optimized monomer ratios and controlled processing allow Bakelite to produce a resign portfolio with a range of molecular weights and dissolution rates. Benefits of our resins include:
These resins are specifically designed for g-line, i-line and advanced i-line photoresist processes.
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