Looking for a Product?


Bakelite's Resins for Semiconductor Photoresist

Bakelite® and Durite™ phenolic/cresylic resins are ideal for photoresist formulations used to manufacture components for the microeletronics industry.

Optimized monomer ratios and controlled processing allow Bakelite to produce a resign portfolio with a range of molecular weights and dissolution rates. Benefits of our resins include: 

  • Improved resolution
  • Better sensitivity 
  • Improved heat resistance
  • Excellent substrate adhesion

These resins are specifically designed for g-line, i-line and advanced i-line photoresist processes.


Discover our portfolio

Learn more

Get in Touch

You want to join our story as a customer or as a talent? We are looking forward to hearing about your ideas or help you if you would like to know more about a product or technology.

Michael Stahl

Your contact for general requests.

Contact us

Gaye Haas, Heike Haas

Your contact for Phenolic and Amino Resins.

Contact us

Ramesh Pisipati

Your contact for Aromatic Polyols.

Contact us

Rene Hackler

Your contact for Molding Compounds.

Contact us

Jan Prins

Your contact for Formaldehyde.

Contact us